The PL-360LP mask aligner filter offered by Rapid Spectral Solutions is perfect for photolithography, giving sharper and more distinct feature walls of the SU-8 photoresist. This filter has a cut-on wavelength of 360nm, letting it transmit the 365, 405, and 465nm mercury lines, while blocking shorter wavelengths.

Rapid Spectral Solutions has several filters available for all kinds of mask aligners, available simply by contacting us.